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Single Crystal Substrates
Created with Pixso. 3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators

3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators

Brand Name: Crystro
Model Number: SCR-2026-08-26-02
Payment Terms: T/T, Western Union,
Detail Information
Place of Origin:
China
Material:
Substituted Gd₃Ga₅O₁₂
Orientation:
(111) ± 0.1°
Primary Flat:
[-110] ± 2°
Secondary Flat:
[-1-12] ± 2°
Diameter Tolerance:
76.20 ± 0.3 Mm
Nominal Siz:
3 Inch (Φ76.2 Mm)
Lattice Constant:
12.497 ± 0.003 Å
Flatness (Max-Min):
≤ 6 μm( 80% Central Effective Area)
Highlight:

3-inch SGGG wafer Faraday rotator

,

Gadolinium Gallium Garnet substrate

,

EPI polished optical isolator substrate

Product Description
3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators
 
The 3-inch SGGG epitaxial substrate is the mainstream specification for Faraday rotator mass production in the optical communications industry. With a diameter of 76.2 mm, standard thickness of 630 ± 30 μm, and (111) orientation, it uses in-house grown large-size SGGG single crystal. Precision-processed and EPI-grade super-smooth polished, it achieves Ra ≤ 1 nm, dislocation density ≤ 10 cm⁻², and TTV ≤ 6 μm, ready for batch LPE growth of BIG/Bi:YIG magneto-optical films.
 
The product features a primary flat ([-110]) and secondary flat ([-1-12]) for precise alignment in epitaxy equipment and subsequent dicing processes. Each batch undergoes full-parameter inspection including lattice constant, orientation, surface particle count, and bow, ensuring high consistency. It is the cost-effective choice for mass production of Faraday rotators for 400G/800G optical module isolators and circulators.
Key Functions
BIG/YIG film LPE epitaxy:
Precisely matched lattice constant with bismuth iron garnet films, ensures epitaxial layer uniformity and magneto-optical performance
Faraday rotator mass-production substrate:
3-inch is the current mainstream size for optical communication rotator production, yielding tens to hundreds of rotator chips per wafer
Core upstream of isolators/circulators:
The rotator chip is the "heart" of optical isolators; SGGG substrate is its foundation
 
Typical Applications
400G/800G optical module isolators
Faraday rotator chip mass production
BIG/Bi:YIG magneto-optical film LPE
Optical circulators and switches
Fiber amplifier ASE noise suppression
Magneto-optical sensors and current transformers
Good price  online

Products Details

Created with Pixso. Home Created with Pixso. Products Created with Pixso.
Single Crystal Substrates
Created with Pixso. 3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators

3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators

Brand Name: Crystro
Model Number: SCR-2026-08-26-02
Payment Terms: T/T, Western Union,
Detail Information
Place of Origin:
China
Brand Name:
Crystro
Model Number:
SCR-2026-08-26-02
Material:
Substituted Gd₃Ga₅O₁₂
Orientation:
(111) ± 0.1°
Primary Flat:
[-110] ± 2°
Secondary Flat:
[-1-12] ± 2°
Diameter Tolerance:
76.20 ± 0.3 Mm
Nominal Siz:
3 Inch (Φ76.2 Mm)
Lattice Constant:
12.497 ± 0.003 Å
Flatness (Max-Min):
≤ 6 μm( 80% Central Effective Area)
Payment Terms:
T/T, Western Union,
Highlight:

3-inch SGGG wafer Faraday rotator

,

Gadolinium Gallium Garnet substrate

,

EPI polished optical isolator substrate

Product Description
3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators
 
The 3-inch SGGG epitaxial substrate is the mainstream specification for Faraday rotator mass production in the optical communications industry. With a diameter of 76.2 mm, standard thickness of 630 ± 30 μm, and (111) orientation, it uses in-house grown large-size SGGG single crystal. Precision-processed and EPI-grade super-smooth polished, it achieves Ra ≤ 1 nm, dislocation density ≤ 10 cm⁻², and TTV ≤ 6 μm, ready for batch LPE growth of BIG/Bi:YIG magneto-optical films.
 
The product features a primary flat ([-110]) and secondary flat ([-1-12]) for precise alignment in epitaxy equipment and subsequent dicing processes. Each batch undergoes full-parameter inspection including lattice constant, orientation, surface particle count, and bow, ensuring high consistency. It is the cost-effective choice for mass production of Faraday rotators for 400G/800G optical module isolators and circulators.
Key Functions
BIG/YIG film LPE epitaxy:
Precisely matched lattice constant with bismuth iron garnet films, ensures epitaxial layer uniformity and magneto-optical performance
Faraday rotator mass-production substrate:
3-inch is the current mainstream size for optical communication rotator production, yielding tens to hundreds of rotator chips per wafer
Core upstream of isolators/circulators:
The rotator chip is the "heart" of optical isolators; SGGG substrate is its foundation
 
Typical Applications
400G/800G optical module isolators
Faraday rotator chip mass production
BIG/Bi:YIG magneto-optical film LPE
Optical circulators and switches
Fiber amplifier ASE noise suppression
Magneto-optical sensors and current transformers