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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy

Name: 4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy
Brand: ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd.
SKU: SCR-2026-08-26-03
Price: 110.00 USD
Availability: InStock

Brand Name:	Crystro
Model Number:	SCR-2026-08-26-03
Payment Terms:	T/T, Western Union,

Detail Information

Product Description

Detail Information

Place of Origin:

China

Nominal Size:

4 Inch (Φ101.6 Mm)

Crystal Structure:

Cubic, Space Group Ia3d

Lattice Constant:

12.497 ± 0.003 Å

Surface Roughness:

Ra ≤ 1 Nm，EPI Ready

Flatness (Max-Min):

≤ 6 μm（80% Central Effective Area）

Total Thickness Variation:

≤ 6 μm

Dislocation Density:

≤ 10 Cm⁻²（ 80% Central Area）

Lattice Uniformity:

Full-wafer ≤ 0.003Å

Dielectric Constant:

ε ≈ 30

Highlight:

4-inch SGGG substrate for Faraday rotator

Gadolinium Gallium Garnet single crystal substrate

EPI-grade polished substrate for optical modules

Product Description

4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy

The 4-inch SGGG large-size substrate is a high-end specification for next-generation high-speed optical communications (1.6T/CPO) and large-scale production lines. With a diameter of 101.6 mm and standard thickness of 800 ± 30 μm (or custom), it is based on large-size single crystal growth technology. Full-wafer lattice constant uniformity ≤ 0.003 Å, dislocation density ≤ 10 cm⁻², and effective area ≥ 80%. Rotator chip output per wafer increases approximately 75% compared to 3-inch, significantly reducing per-chip cost.

Large-size SGGG crystal growth is technically demanding, requiring strict thermal field control, raw material purity, and annealing processes. Through optimized Czochralski growth and multi-step annealing, this product achieves low-stress, low-absorption, high-uniformity crystal quality. Combined with primary/secondary flats and EPI-grade super-smooth polishing, it meets the large-size mass production requirements of high-end magneto-optical film epitaxy equipment.

Key Functions

High-capacity substrate for 1.6T/CPO era:

4-inch large size adapts to next-gen high-speed module rotator mass production, more chips per wafer

Lower per-chip cost:

~75% larger effective area than 3-inch, dilutes epitaxy, dicing, and inspection costs

High-end magneto-optical film epitaxy:

High lattice uniformity ensures large-area BIG film thickness and magneto-optical performance consistency

Core material for domestic substitution:

Breaks overseas monopoly on large-size SGGG substrates, supports domestic optical module supply chain independence

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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy

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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy

Brand Name:	Crystro
Model Number:	SCR-2026-08-26-03
Payment Terms:	T/T, Western Union,

Detail Information

Product Description

Detail Information

Place of Origin:

China

Brand Name:

Crystro

Model Number:

SCR-2026-08-26-03

Nominal Size:

4 Inch (Φ101.6 Mm)

Crystal Structure:

Cubic, Space Group Ia3d

Lattice Constant:

12.497 ± 0.003 Å

Surface Roughness:

Ra ≤ 1 Nm，EPI Ready

Flatness (Max-Min):

≤ 6 μm（80% Central Effective Area）

Total Thickness Variation:

≤ 6 μm

Dislocation Density:

≤ 10 Cm⁻²（ 80% Central Area）

Lattice Uniformity:

Full-wafer ≤ 0.003Å

Dielectric Constant:

ε ≈ 30

Payment Terms:

T/T, Western Union,

Highlight:

4-inch SGGG substrate for Faraday rotator

Gadolinium Gallium Garnet single crystal substrate

EPI-grade polished substrate for optical modules

Product Description

4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy

Key Functions

High-capacity substrate for 1.6T/CPO era:

4-inch large size adapts to next-gen high-speed module rotator mass production, more chips per wafer

Lower per-chip cost:

~75% larger effective area than 3-inch, dilutes epitaxy, dicing, and inspection costs

High-end magneto-optical film epitaxy:

High lattice uniformity ensures large-area BIG film thickness and magneto-optical performance consistency

Core material for domestic substitution:

Breaks overseas monopoly on large-size SGGG substrates, supports domestic optical module supply chain independence

Tags:

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